2026-07-072026-07-07http://salesiana.dossiersoluciones.com/handle/123456789/212465A maskless post-processing technique for CMOS chips is developed that enables the fabrication of RF MEMS parallel-plate capacitors with a high quality factor and a very compact size. Simulations and measured results are presented for several MEMS/CMOS capacitors. A 2-pole coupled line tunable bandpass filter with a center frequency of 9.5 GHz is designed, fabricated and tested. A tuning range of 17% is achieved using integrated variable MEMS/CMOS capacitors with a quality factor exceeding 20. The tunable filter occupies a chip area of 1.2 x 2.1 mm2.Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/handle/2042/16838)Other Computer Sciencetext