2026-07-072026-07-07http://salesiana.dossiersoluciones.com/handle/123456789/28970We have studied the influence of disorder on the Kondo effect in thin films of Cu(Mn), i.e., Cu doped with a small amount of Mn. We find that the Kondo contribution to the resistivity is suppressed when the elastic mean-free-path, $λ$, is reduced. While this is qualitatively similar to results found previously by our group in a different material, our new experiments reveal in detail how this suppression depends on both film thickness and $λ$. These results are compared with the theory of Martin, Wan, and Phillips. While there is general qualitative agreement with this theory, there appear to be some quantitative discrepancies.15 pages, 3 figuresMesoscale and Nanoscale PhysicsEffect of disorder on the Kondo behavior of thin Cu(Mn) filmstext