Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

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The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.
6 pages, 7 postscript figures, talk at the XIV-th Int. School "Particles and Cosmology"

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Instrumentation and Detectors

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http://salesiana.dossiersoluciones.com/handle/123456789/142300

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/0711.2614
 http://arxiv.org/abs/0711.2614

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arXiv