Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

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dc.creatorGavriljuk, Yu. M.
dc.creatorGavrin, V. N.
dc.creatorGangapshev, A. M.
dc.creatorKazalov, V. V.
dc.creatorKuzminov, V. V.
dc.creatorPanasenko, S. I.
dc.creatorRatkevich, S. S.
dc.date2007-11-16
dc.date.accessioned2026-07-07T08:43:24Z
dc.date.available2026-07-07T08:43:24Z
dc.descriptionThe construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.
dc.description6 pages, 7 postscript figures, talk at the XIV-th Int. School "Particles and Cosmology"
dc.identifierhttps://arxiv.org/abs/0711.2614
dc.identifierhttp://arxiv.org/abs/0711.2614
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/142300
dc.subjectInstrumentation and Detectors
dc.titleMeasurement of surface alpha-acrivity of different samples with ion pulse ionization chamber
dc.typetext

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