Low temperature photoluminescence study of thin epitaxial GaAs films on Ge substrates

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Thin epitaxial GaAs films, with thickness varying from 140 to 1000 nm and different Si doping levels, were grown at 650C by organometallic vapor phase epitaxy (OMVPE) on Ge substrates and extensively analyzed by low-temperature photoluminescence (PL) spectroscopy.
19 pages, 14 figures

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Materials Science

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http://salesiana.dossiersoluciones.com/handle/123456789/126347

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/cond-mat/0703661
 http://arxiv.org/abs/cond-mat/0703661
 J. Appl. Phys. 99, 093514, 2006

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arXiv