Anomalous diffusion mediated by atom deposition into a porous substrate

Brault, Pascal; Josserand, Christophe; Bauchire, Jean-Marc; Caillard, Amael; Charles, Christine; Boswell, Rod W.

Anomalous diffusion mediated by atom deposition into a porous substrate

Authors

Brault, Pascal

Josserand, Christophe

Description

Constant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time
4 pages