Anomalous diffusion mediated by atom deposition into a porous substrate

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dc.creatorBrault, Pascal
dc.creatorJosserand, Christophe
dc.creatorBauchire, Jean-Marc
dc.creatorCaillard, Amael
dc.creatorCharles, Christine
dc.creatorBoswell, Rod W.
dc.date2009-02-16
dc.date.accessioned2026-07-07T12:42:12Z
dc.date.available2026-07-07T12:42:12Z
dc.descriptionConstant flux atom deposition into a porous medium is shown to generate a dense overlayer and a diffusion profile. Scaling analysis shows that the overlayer acts as a dynamic control for atomic diffusion in the porous substrate. This is modeled by generalizing the porous diffusion equation with a time-dependent diffusion coefficient equivalent to a nonlinear rescaling of time
dc.description4 pages
dc.identifierhttps://arxiv.org/abs/0902.2618
dc.identifierhttp://arxiv.org/abs/0902.2618
dc.identifierPhysical Review Letters 102 (2009) 045901
dc.identifierdoi:10.1103/PhysRevLett.102.045901
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/219995
dc.subjectStatistical Mechanics
dc.titleAnomalous diffusion mediated by atom deposition into a porous substrate
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