Nanolithography with metastable helium atoms in a high-power standing-wave light field

Petra, S. J. H.; Feenstra, L.; Hogervorst, W.; Vassen, W.

Nanolithography with metastable helium atoms in a high-power standing-wave light field

Authors

Description

We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely cooled and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10E7) increases the confinement of the atoms in the standing-wave considerably, and makes the alignment of the experimental setup less critical. Due to the high internal energy of the metastable helium atoms (20 eV), a dose of only one atom per resist molecule is required. With an exposure time of only eight minutes, parallel lines with a separation of 542 nm and a width of 100 nm (1/11th of the wavelength used for the optical mask) are created.
5 pages, 5 figures