Nanolithography with metastable helium atoms in a high-power standing-wave light field

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dc.creatorPetra, S. J. H.
dc.creatorFeenstra, L.
dc.creatorHogervorst, W.
dc.creatorVassen, W.
dc.date2003-08-19
dc.date.accessioned2026-07-07T05:49:53Z
dc.date.available2026-07-07T05:49:53Z
dc.descriptionWe have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is transversely cooled and guided through an intense standing-wave light field. Compared to commonly used low-power optical masks, a high-power light field (saturation parameter of 10E7) increases the confinement of the atoms in the standing-wave considerably, and makes the alignment of the experimental setup less critical. Due to the high internal energy of the metastable helium atoms (20 eV), a dose of only one atom per resist molecule is required. With an exposure time of only eight minutes, parallel lines with a separation of 542 nm and a width of 100 nm (1/11th of the wavelength used for the optical mask) are created.
dc.description5 pages, 5 figures
dc.identifierhttps://arxiv.org/abs/physics/0308076
dc.identifierhttp://arxiv.org/abs/physics/0308076
dc.identifierAppl. Phys. B 78 (2), 133-136 (2004)
dc.identifierdoi:10.1007/s00340-003-1371-8
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/85549
dc.subjectAtomic Physics
dc.titleNanolithography with metastable helium atoms in a high-power standing-wave light field
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