Surface Conditioning Effect on Vacuum Microelectronics Components Fabricated by Deep Reactive Ion Etching

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Advances in material processing such as silicon micromachining are opening the way to vacuum microelectronics. Two-dimensional vacuum components can be fabricated using the microsystems processes. We developed such devices using a single metal layer and silicon micromachining by DRIE. The latter technological step has significant impact on the characteristics of the vacuum components. This paper presents a brief summary of electron emission possibilities and the design leading to the fabrication of a lateral field emission diode. First measurement results and the aging of the devices are also discussed.
Submitted on behalf of TIMA Editions (http://irevues.inist.fr/tima-editions)

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Other Computer Science

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http://salesiana.dossiersoluciones.com/handle/123456789/143006

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/0711.3276
 http://arxiv.org/abs/0711.3276
 Dans Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS - DTIP 2006, Stresa, Lago Maggiore : Italie (2006)

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