A Monolithic Pixel Sensor in 0.15 micron Fully Depleted SOI Technology

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This letter presents the design of a monolithic pixel sensor with 10x10 micron^2 pixels in OKI 0.15 micron fully depleted SOI technology and first results of its characterisation. The response of the chip to charged particles has been studied on the 1.35 GeV electron beam at the LBNL ALS.
4 pages, 5 figures, submitted to Nuclear Instruments and Methods A

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Instrumentation and Detectors

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http://salesiana.dossiersoluciones.com/handle/123456789/193733

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/0709.4218
 http://arxiv.org/abs/0709.4218
 Nucl.Instrum.Meth.A583:526-528,2007
 doi:10.1016/j.nima.2007.09.042

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arXiv