Circuit with small-capacitance high-quality Nb Josephson junctions

dc.creatorWatanabe, Michio
dc.creatorNakamura, Yasunobu
dc.creatorTsai, Jaw-Shen
dc.date2003-11-14
dc.date2004-01-16
dc.date.accessioned2026-07-07T02:54:46Z
dc.date.available2026-07-07T02:54:46Z
dc.descriptionWe have developed a fabrication process for nanoscale tunnel junctions which includes focused-ion-beam etching from different directions. By applying the process to a Nb/(Al-)Al_2O_3/Nb trilayer, we have fabricated a Nb single-electron transistor (SET), and characterized the SET at low temperatures, T=0.04-40 K. The superconducting gap energy and the transition temperature of the Nb SET agree with the bulk values, which suggests high quality Nb junctions. The single-electron charging energy of the SET is estimated to be larger than 1 K.
dc.descriptionPublished version, RevTeX4
dc.identifierhttps://arxiv.org/abs/cond-mat/0311332
dc.identifierhttp://arxiv.org/abs/cond-mat/0311332
dc.identifierAppl. Phys. Lett. 84, 410 (2004)
dc.identifierdoi:10.1063/1.1640798
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/22688
dc.subjectMesoscale and Nanoscale Physics
dc.subjectMaterials Science
dc.titleCircuit with small-capacitance high-quality Nb Josephson junctions
dc.typetext

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