Electron Optic Design of Arrayed E-Beam Microcolumns Based Systems for Wafer Defects Inspection

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dc.creatorKazmiruk, V. V.
dc.creatorSavitskaja, T. N.
dc.date2008-05-05
dc.date.accessioned2026-07-07T09:37:02Z
dc.date.available2026-07-07T09:37:02Z
dc.descriptionIn this paper is considered a matter of the system for wafer defect inspection (WDIS) practical realization. Such systems are on the agenda as the next generation and substitution for light optics and single $e$-beam based WDISs.
dc.description16 pages, 18 figures
dc.identifierhttps://arxiv.org/abs/0805.0495
dc.identifierhttp://arxiv.org/abs/0805.0495
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/160320
dc.subjectOptics
dc.subjectInstrumentation and Detectors
dc.titleElectron Optic Design of Arrayed E-Beam Microcolumns Based Systems for Wafer Defects Inspection
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