Nanostructuring Optical Waveguides by Focused Ion Beam Milling. Near-Field Characterization

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dc.creatorLacour, F.
dc.creatorSabac, A.
dc.creatorSpajer, M.
dc.date2008-01-26
dc.date.accessioned2026-07-07T08:56:42Z
dc.date.available2026-07-07T08:56:42Z
dc.descriptionNanostructures have become an attractive subject due to many applications, particularly the photonic bandgap effect observed in photonic crystals. Nevertheless, the fabrication of such structures remains a challenge because of accurate requirement concerning regularity, shape, hole depth etc. of the structure. E-beam lithography permits a good control of dimensional parameters but needs a 1-step fabrication process. In our work, we have to combine traditional strip-load waveguides (SiO2/SiON/SiO2 on Si) and nanostructures whose dimension are totally different. This imposes a 2-step process where waveguides and nanostructures are successively fabricated. We have at our disposal different ways to characterize these nanostructures. A direct aspect control during and after FIB treatment can be achieved by FIB and SEM imaging. Scanning near-field optical microscopy (SNOM) is currently the most effective way to test guiding confinement in such surface structures by detecting the evanescent field.
dc.descriptionAvailable online at http://www.kps.or.kr/home/kor/journal/library/search.asp?
dc.identifierhttps://arxiv.org/abs/0801.4062
dc.identifierhttp://arxiv.org/abs/0801.4062
dc.identifierJournal of the Korean Physical Society 47, 91 (2005) S175-S181
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/146703
dc.subjectOptics
dc.titleNanostructuring Optical Waveguides by Focused Ion Beam Milling. Near-Field Characterization
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