Atomically straight steps on vicinal Si (111) surfaces prepared by step-parallel current in the kink-up direction

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We demonstrate that annealing of a vicinal Si(111) surface at about 800 C with a direct current in the direction that ascends the kinks enhances the formation of atomically straight step edges over micrometer lengths, while annealing with a current in the opposite direction does not. Every straight step edge has the same atomic configuration U(2,0), which is useful as a template for the formation of a variety of nanostructures. A phenomenological model based on electromigration of charged mobile atoms explains the observed current-polarity dependent behavior.
Accepted for publication in Appl. Phys. Lett. Numbers of pages and figures are 12 and 4, respectively

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Materials Science

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http://salesiana.dossiersoluciones.com/handle/123456789/125558

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/cond-mat/0507232
 http://arxiv.org/abs/cond-mat/0507232
 Appl. Phys. Lett. 87, 031903 (2005)
 doi:10.1063/1.1995946

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