Measurement of Coulomb drag between Anderson insulators

Simple item page
dc.creatorElsayad, K.
dc.creatorCarini, J. P.
dc.creatorBaxter, D. V.
dc.date2008-02-27
dc.date.accessioned2026-07-07T09:23:36Z
dc.date.available2026-07-07T09:23:36Z
dc.descriptionWe report observations of the Coulomb drag effect between two effectively 2-d insulating a-Si_{1-x}Nb_{x} films. We find that there only exist a limited range of experimental parameters over which we can measure a sizable linear-response transresistivity (ρ_{d}). The temperature dependence of ρ_{d} is consistent with the layers being Efros-Shklovskii Anderson insulators provided that a 3-d density of states and a localization length smaller than that obtained from the DC layer-conductivity are assumed.
dc.description4 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/0802.4073
dc.identifierhttp://arxiv.org/abs/0802.4073
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/155793
dc.subjectMesoscale and Nanoscale Physics
dc.subjectDisordered Systems and Neural Networks
dc.titleMeasurement of Coulomb drag between Anderson insulators
dc.typetext

Files

Collections

arXiv