Optical characterization of a-Si:H thin films grown by Hg-Photo-CVD

Thumbnail Image

Date

Authors

Journal Title

Journal ISSN

Volume Title

Publisher

Abstract

Description

Mercury-Sensitized Photo-Assisted Chemical Vapor Deposition (Hg-Photo-CVD) technique opens new possibilities for reducing thin film growth temperature and producing novel semiconductor materials suitable for the future generation of high efficiency thin film solar cells onto low cost flexible plastic substrates. This paper provides some experimental data resulting from the optical characterization of hydrogenated amorphous silicon thin films grown by this deposition technique. Experiments have been performed on both as-deposited layers and thermal annealed ones. Keywords: Photovoltaic, Solar Cell, Thin films, Nano-Crystalline Silicon, Hydrogenated Amorphous Silicon, Optical Properties, Thermal Annealing PACS Numbers: 68.60.Dv, 78.66.Jg, 78.66.-w, 73.50.Pz, 81.15.-z, 84.60.Jt
17 pages, 8 figures, 73 references. ICTP Preprint, August 2006 (Submitted to the Moroccan Journal of Condensed Matter

Keywords

Materials Science

Citation

URI

http://salesiana.dossiersoluciones.com/handle/123456789/114781

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/cond-mat/0608646
 http://arxiv.org/abs/cond-mat/0608646

Collections

arXiv