Optical characterization of a-Si:H thin films grown by Hg-Photo-CVD

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dc.creatorBarhdadi, A.
dc.creatorKarbal, S.
dc.creatorMgafad, N.
dc.creatorBenmakhlouf, A.
dc.creatorIdrissi, M. Chafik El
dc.creatorAka, B. M.
dc.date2006-08-29
dc.date.accessioned2026-07-07T07:19:51Z
dc.date.available2026-07-07T07:19:51Z
dc.descriptionMercury-Sensitized Photo-Assisted Chemical Vapor Deposition (Hg-Photo-CVD) technique opens new possibilities for reducing thin film growth temperature and producing novel semiconductor materials suitable for the future generation of high efficiency thin film solar cells onto low cost flexible plastic substrates. This paper provides some experimental data resulting from the optical characterization of hydrogenated amorphous silicon thin films grown by this deposition technique. Experiments have been performed on both as-deposited layers and thermal annealed ones. Keywords: Photovoltaic, Solar Cell, Thin films, Nano-Crystalline Silicon, Hydrogenated Amorphous Silicon, Optical Properties, Thermal Annealing PACS Numbers: 68.60.Dv, 78.66.Jg, 78.66.-w, 73.50.Pz, 81.15.-z, 84.60.Jt
dc.description17 pages, 8 figures, 73 references. ICTP Preprint, August 2006 (Submitted to the Moroccan Journal of Condensed Matter
dc.identifierhttps://arxiv.org/abs/cond-mat/0608646
dc.identifierhttp://arxiv.org/abs/cond-mat/0608646
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/114781
dc.subjectMaterials Science
dc.titleOptical characterization of a-Si:H thin films grown by Hg-Photo-CVD
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