Entangled-State Lithography: Tailoring any Pattern with a Single State

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We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N+1) \times (N+1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2 N$-photon state.
4 pages, 4 figures

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Quantum Physics

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http://salesiana.dossiersoluciones.com/handle/123456789/89185

Consulte el texto completo en el siguiente enlace:

https://arxiv.org/abs/quant-ph/0011075
 http://arxiv.org/abs/quant-ph/0011075
 Phys.Rev.Lett. 86 (2001) 4516-4519
 doi:10.1103/PhysRevLett.86.4516

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