Entangled-State Lithography: Tailoring any Pattern with a Single State

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dc.creatorBjork, Gunnar
dc.creatorSanchez-Soto, Luis L.
dc.creatorSoderholm, Jonas
dc.date2000-11-17
dc.date.accessioned2026-07-07T06:01:12Z
dc.date.available2026-07-07T06:01:12Z
dc.descriptionWe demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N+1) \times (N+1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2 N$-photon state.
dc.description4 pages, 4 figures
dc.identifierhttps://arxiv.org/abs/quant-ph/0011075
dc.identifierhttp://arxiv.org/abs/quant-ph/0011075
dc.identifierPhys.Rev.Lett. 86 (2001) 4516-4519
dc.identifierdoi:10.1103/PhysRevLett.86.4516
dc.identifier.urihttp://salesiana.dossiersoluciones.com/handle/123456789/89185
dc.subjectQuantum Physics
dc.titleEntangled-State Lithography: Tailoring any Pattern with a Single State
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